Chandrasekaran Venkatasubramanian, graduate student in engineering science and mechanics, presented a paper at the 2008 Ion Beam Modification of Materials (IBMM) meeting in Dresden, Germany. The paper was titled “Ion implantation studies on VOx films prepared by pulsed dc reactive sputtering.” Co-authors of the paper were Professors S. Ashok and Mark Horn. To learn more about the meeting, please visit their web site.