Mark Horn, associate professor of engineering science and mechanics, and ESM graduate student Charan Srinivasan were part of a collaborative research team led by Paul S. Weiss, distinguished professor of chemistry and physics, that developed a new nanolithography process that will "extend lithography to applications beyond traditional semicondutors". A brief article of the process titled "Taking Nanolithography Beyond Semiconductors" appears in the spring 2007 issue of Science Journal.

The new process was first described in the 22 December 2006 issue of the journal of Advanced Materials.