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Measuring stress and strain in Si devices. The Nanoscale Stress Project at NIST

Category: EMch/ESc 514 Seminars

Posted by: sls60 on Oct 3, 2011

Lawrence H. Friedman
National Institute of Standards Technology, Gaithersburg, MD

Wednesday, October 5, 2011
3:35pm - 4:25pm
114 EES Building